FEBID and FIBID of Metal Nanostructures
Focused Electron Beam Induced Deposition (FEBID) and Focused Ion Beam Induced Deposition (FIBID) use organometallic precursors and electron or ion beams to deposit size- and shape-controlled metal nanostructures for use in repair of lithographic masks and integrated circuits. FEBID and FIBID nanostructures have also been used for catalysis, magnetics, nanoelectronics and plasmonics applications. We are designing and synthesizing precursors for use in FEBID and FIBID of nanostructures with higher purity than can be achieved by the common practice of using CVD precursors for these techniques. Modeling of FEBID and FIBID with our precursors is carried out with several collaborators including Prof. Howard Fairbrother (Johns Hopkins University), Prof. Oddur Ingólfsson (University of Iceland), Prof. Petra Swiderek (U Bremen), Dr. Ivo Utke (EMPA) and Dr. Juraj Fedor (Czech Academy of Sciences). The collaborative experiments include Ultra High Vacuum (UHV) surface science modeling of FEBID/FIBID, gas phase electron-molecule crossed beam experiments, FEBID/FIBID in modified electron microscopes and ab initio calculations that help us understand the chemical mechanisms behind these deposition techniques. We use the information to design more effective precursors.
Images: Reisecker, Winkler, Plank, Adv. Funct. Mater. 2024, 2407567