CVD of Tungsten Oxide Films as Hole Injection Layers for OLEDs

OLED (organic light emitting diode) devices such as flat panel displays and lighting require hole injection layers to facilitate electron migration through the device. Amorphous thin films of tungsten oxide (WO_x) are promising candidates for this application. We are synthesizing volatile tungsten precursors with oxo and alkoxide ligands as single source precursors for the CVD of WO_x. Variation of the ligands allows control of the volatility, decomposition chemistry and materials properties of the deposited films. In addition to films, we have also grown nanorods with possible application in sensors.